后处理对HfO<sub>2</sub>薄膜光学特性及抗激光损伤阈值的影响

吴倩; 罗晋; 潘峰

doi:10.3788/OPE.20162412.3000

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后处理对HfO₂薄膜光学特性及抗激光损伤阈值的影响

高功率激光光学元器件 | 更新时间：2020-08-13

- 后处理对HfO₂薄膜光学特性及抗激光损伤阈值的影响
- Effects of posttreatments on optical properties and laser induced damage thresholds of HfO₂ thin films
- 光学精密工程 2016年24卷第12期页码：3000-3004
- 作者机构：
  
  成都精密光学工程研究中心, 四川成都 610000
- 作者简介：
  
  吴倩(1980-), 女, 四川成都人, 本科, 工程师, 2003年于长春理工大学获得学士学位, 现为成都精密光学工程中心工程师, 主要从事激光薄膜的制备与检测。E-mail:wqxiaozhu@126.com WU Qian, E-mail: wqxiaozhu@126.com
- 基金信息：
  
  大口径宽带低色散高阈值膜研制(2015AA8044064)
- DOI：10.3788/OPE.20162412.3000
  中图分类号： O484.41
- 收稿日期：2016-10-08，
  
  录用日期：2016-11-30，
  
  纸质出版日期：2016-12-25
- 稿件说明：
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吴倩, 罗晋, 潘峰. 后处理对HfO₂薄膜光学特性及抗激光损伤阈值的影响[J]. 光学精密工程, 2016,24(12):3000-3004.

Qian WU, Jin LUO, Feng PAN. Effects of posttreatments on optical properties and laser induced damage thresholds of HfO₂ thin films[J]. Optics and precision engineering, 2016, 24(12): 3000-3004.
吴倩, 罗晋, 潘峰. 后处理对HfO₂薄膜光学特性及抗激光损伤阈值的影响[J]. 光学精密工程, 2016,24(12):3000-3004. DOI： 10.3788/OPE.20162412.3000.

Qian WU, Jin LUO, Feng PAN. Effects of posttreatments on optical properties and laser induced damage thresholds of HfO₂ thin films[J]. Optics and precision engineering, 2016, 24(12): 3000-3004. DOI： 10.3788/OPE.20162412.3000.

摘要

利用电子束蒸发技术制备了氧化铪薄膜，并分别用氧气氛下退火和激光预处理两种后处理方法对样品进行了处理。介绍了两种后处理工艺和相关的设备，测试分析了样品的透过率、吸收和抗激光损伤阈值。对比了两种后处理方法对降低吸收和提高激光损伤阈值的效果，讨论了它们的作用原理。实验结果表明，激光预处理能有效降低样品的吸收值，提高样品的抗激光损伤阈值。采用一步法（50%初始损伤阈值）预处理后，三倍频氧化铪薄膜的损伤阈值从13 J/cm

提升到15 J/cm

；采用两步法（依次50%、80%初始损伤阈值）预处理后，三倍频氧化铪薄膜的损伤阈值从13 J/cm

提升到17.5 J/cm

，损伤几率曲线整体向高通量区域平移。

Abstract

HfO

thin films were prepared by electron beam evaporation technique. Two kinds of post-treatment methods

anneal in oxygen and laser treatment

were employed to treat the samples under the oxygen condition. The procedures of post-treatment and corresponding treatment equipment were introduce and the optical transmittance

absorption and laser induced damage threshold of a HfO

thin film sample at 355 nm were measured before and after the treatments. The treatment results on reducing absorption and improving the LIDT by above two post-treatment methods were compared

and their working principles were discussed. The experiments demonstrate that laser treatment decreases the sample absorption and improves the LIDT of HfO

thin films. With one step (50% LIDT)

the LIDT of the HfO

film at 355 nm increases from 13 J/cm

to 15 J/cm

. With two steps (50% LIDT and 80% LIDT)

the LIDT of the HfO

film at 355 nm increases from 13 J/cm

to 17.5 J/cm

and the damage probability curve translates to a high flux area wholly.

关键词

Keywords

references

FADEL M, AZIMM O A, OMER O A, et al..A study of some optical properties of hafnium dioxide (HFO2) thin films and their applications[J].Applied physics A.Materials Science &Processing.1998, 66;335-343.

ALVISI M, GIULIOM D, MARRONES G, et al..HfO 2 films with high laser damage threshold[J].Thin Solid Films, 2000, 358;250-258.

高卫东, 张伟丽, 范树海, 等.HfO 2 薄膜的结构对抗激光损伤阈值的影响[J].光子学报, 2005, 34(2):176-179.

GAO W D, ZHANG W L, FAN SH H, et al..Effecrs of the structure of HfO2 thin films on its laser induced damage threshold[J].Acta Photonica Sinica, 2005, 34(2);176-179.

顾培夫.薄膜技术[M].浙江大学出版社, 1990:76.

GU P F.Thin films technology[M].Zhejiang University Press, 1990:76.

郑轶, 刘志超, 马平, 等.中等孔径光斑预处理[J].强激光与粒子束, 2013, 25(12):3180-3184. http://cn.bing.com/academic/profile?id=d17969c0e3686de274127775f4148e46&encoded=0&v=paper_preview&mkt=zh-cn

ZHENG Y, LIU ZH CH, MA P, CHEN S L, ZHANG Q H.Laser conditioning technique of mid-size laser spot[J].High Power Laser and Particle Beams, 2013, 25(12):3180-3184.

卫耀伟, 张哲, 刘浩, 等. HfO 2 与SiO 2 薄膜的激光预处理研究[J].强激光与粒子束, 2013, 25(12), 3338-3342.

WEI Y W, ZHANG ZH, LIU H, et al.. Laser conditioning effect on HfO 2 /SiO 2 film[J].High Power Laser and Particle Beams, 2013, 25(12):3338-332.

李刚, 孙连春, 于兆波, 等.光学薄膜中的偏振效应[J].光学精密工程, 2003, 11(6):647-651.

LI G, SUN L CH, YU ZH B, et al.. The polarization effect in the optical thin film[J]. Editorial Office of Optics and Precision Engineering, 2003, 11(6):647-651.

王旭迪, 徐向东, 刘颖, 等. HfO 2 薄膜的离子束刻蚀特性研究[J].光学精密工程, 2004, 12(5):454-458.

WANG X D, SHU X D, LIU Y, et al.. Study on ion beam etching characteristics of HfO 2 film[J]. Editorial Office of Optics and Precision Engineering, 2004, 12(5):454-458.

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后处理对HfO2薄膜光学特性及抗激光损伤阈值的影响

Effects of posttreatments on optical properties and laser induced damage thresholds of HfO2 thin films

DOI：10.3788/OPE.20162412.3000

摘要

Abstract

关键词

Keywords

references

后处理对HfO₂薄膜光学特性及抗激光损伤阈值的影响

Effects of posttreatments on optical properties and laser induced damage thresholds of HfO₂ thin films