大型环抛机蜡盘平面度的测量

王哲; 徐学科; 邵建达; 顿爱欢; 杨明红; 范永涛; 方媛媛; 高文兰; 刘方

doi:10.3788/OPE.20162412.3048

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大型环抛机蜡盘平面度的测量

高功率激光光学元器件 | 更新时间：2020-08-13

- 大型环抛机蜡盘平面度的测量
- Flatness measurement of pitch lap for large continuous polisher
- 光学精密工程 2016年24卷第12期页码：3048-3053
- 作者机构：
  
  1.中国科学院上海光学精密机械研究所, 上海 201800
  2.上海恒益光学精密机械有限公司, 上海 201800
  3.华中科技大学光学与电子信息学院, 湖北武汉 430000
- 作者简介：
  
  王哲(1989-), 男, 河北张家口人, 硕士, 助理工程师, 2014年于长春理工大学获得硕士学位, 现就职于上海光机所, 主要从事光学加工及检测技术的研究。E-mail:wangzhe@siom.ac.cn WANG Zhe, E-mail: wangzhe@siom.ac.cn
  [ "邵建达(1964-), 男, 浙江宁海人, 研究员, 博士生导师, 1986年毕业于浙江大学无线电与电子工程学系, 1994年6月、1998年3月于中国科学院上海光学精密机械研究所分别获得光学工程硕士、博士学位, 长期从事光学薄膜技术与光电信息功能薄膜的研究工作, 涉及薄膜的沉积技术、监控技术以及薄膜的光学特性和物理特性的研究与发展。E-mail:jdshao@mail.shcnc.ac.cn" ]
- 基金信息：
  
  国家自然科学基金青年科学基金资助项目(61605228)
- DOI：10.3788/OPE.20162412.3048
  中图分类号： TH703;TN305.2
- 收稿日期：2016-10-18，
  
  录用日期：2016-11-17，
  
  纸质出版日期：2016-12-25
- 稿件说明：
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王哲, 徐学科, 邵建达, 等. 大型环抛机蜡盘平面度的测量[J]. 光学精密工程, 2016,24(12):3048-3053.

Zhe WANG, Xue-ke XU, Jian-da SHAO, et al. Flatness measurement of pitch lap for large continuous polisher[J]. Optics and precision engineering, 2016, 24(12): 3048-3053.
王哲, 徐学科, 邵建达, 等. 大型环抛机蜡盘平面度的测量[J]. 光学精密工程, 2016,24(12):3048-3053. DOI： 10.3788/OPE.20162412.3048.

Zhe WANG, Xue-ke XU, Jian-da SHAO, et al. Flatness measurement of pitch lap for large continuous polisher[J]. Optics and precision engineering, 2016, 24(12): 3048-3053. DOI： 10.3788/OPE.20162412.3048.

摘要

针对大口径平面光学元件全频谱面形技术指标的高效率、高精度收敛，研究了环形抛光技术。考虑环抛机沥青蜡盘的平面度直接影响工件面形的收敛效率，本文利用准直激光束作为参考，设计研制了测量精度高，重复性精度达到±1 μm的大型环抛机抛光蜡盘平面度测量专用装置。分析了环抛过程中蜡盘表面平面度和工件面型PV值之间的变化规律和相关性，根据测量数据得出了蜡盘平面度数据和工件面形的对应关系。实验显示：当平面度和面形曲线相差较大时，工件面形可快速收敛至1λ左右，并由粗抛向精抛工序快速过渡。提出的大型环抛机抛光蜡盘平面度监测装置实现了对湿滑胶体平面的高精度、快速测量，为环抛的确定性抛光工艺提供了重要的技术支持。

Abstract

For the high efficient and high accuracy convergence of surface figure of a large aperture workpiece

the continuous polishing technology was investigated. As the convergence efficiency of surface figure of the workpiece was effected directly by the flatness of pitch lap in a continuous polisher

a high precision measurement equipment with repeatability accuracy of ±1

m was designed and developed for measuring the flatness of the pitch lap. The change rules and correlation between the flatness of pitch lap and the PV value of surface figure for the workpiece were analyzed during continuous polishing

and relationship between the flatness data and the surface figure of the workpiece was obtained based on the measured data. The experiments indicate that when the diference between flatness and surface curve are larger

the shape of the workpiece is rapidly converged to about 1λ

meanwhile the polishing process transits from a rough polishing to a fine polishing. The high precision measurement equipment proposed by the paper implements precise measurement of the flatness for a large wet pitch lap and provides an important technical support for deterministic continuous polishing.

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