随动压力分布下的非球面抛光去除函数

李徐钰; 魏朝阳; 徐文东; 邵建达

doi:10.3788/OPE.20162412.3061

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随动压力分布下的非球面抛光去除函数

高功率激光光学元器件 | 更新时间：2020-08-13

- 随动压力分布下的非球面抛光去除函数
- Tool influence function in aspheric polishing under dynamic pressure distribution
- 光学精密工程 2016年24卷第12期页码：3061-3067
- 作者机构：
  
  中国科学院上海光学精密机械研究所, 上海 201800
- 作者简介：
  
  [ "李徐钰(1992-), 男, 江苏常州人, 博士研究生, 2014年于东南大学获得学士学位, 主要研究先进非球面制造与检测技术。E-mail:jsczlixuyu@sina.cn" ]
  魏朝阳(1980-), 男, 副研究员, 硕士生导师, 2002年于郑州大学光电子技术专业获得学士学位, 2007年于中国科学院上海光学精密机械研究所获得博士学位, 现为中科院上海光学精密机械研究所在读博士研究生, 主要研究方向包括先进光学制造、检测技术和激光破坏等。E-mail:siomwei@siom.ac.cn WEI Chao-yang, E-mail:siomwei@siom.ac.cn
- 基金信息：
  
  中国科学院青年创新促进会科研基金资助项目；国家重大科技专项资助项目
- DOI：10.3788/OPE.20162412.3061
  中图分类号： TH703;TN305.2
- 收稿日期：2016-10-21，
  
  录用日期：2016-11-17，
  
  纸质出版日期：2016-12-25
- 稿件说明：
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李徐钰, 魏朝阳, 徐文东, 等. 随动压力分布下的非球面抛光去除函数[J]. 光学精密工程, 2016,24(12):3061-3067.

Xu-yu LI, Chao-yang WEI, Wen-dong XU, et al. Tool influence function in aspheric polishing under dynamic pressure distribution[J]. Optics and precision engineering, 2016, 24(12): 3061-3067.
李徐钰, 魏朝阳, 徐文东, 等. 随动压力分布下的非球面抛光去除函数[J]. 光学精密工程, 2016,24(12):3061-3067. DOI： 10.3788/OPE.20162412.3061.

Xu-yu LI, Chao-yang WEI, Wen-dong XU, et al. Tool influence function in aspheric polishing under dynamic pressure distribution[J]. Optics and precision engineering, 2016, 24(12): 3061-3067. DOI： 10.3788/OPE.20162412.3061.

摘要

考虑去除函数对数控小工具抛光光学元件精度的影响，提出了如何根据需要加工的非球面参数以及抛光盘参数得到最优去除函数的方法。由于计算非球面上去除函数的核心是准确获得抛光盘与镜面间的动态压力分布，本文提出利用有限元法仿真抛光盘与非球面间的压力分布，并结合经典Preston方程与行星运动模型来得到非球面不同位置处的去除函数。基于随动压力分布模型，分析了沥青盘抛光非球面时在不同抛光位置处去除函数的变化。在曲率半径为1 000 mm的球面上进行了去除函数验证实验。结果表明：基于本文理论得到的去除函线型更接近实际情况，皮尔逊系数达到了0.977。本文提出的方法可以方便地调整加工位置来得到相应的压力分布，实现去除函数的优化，对提高加工效率与精度有实际指导意义。

Abstract

By taking the effect of Tool Influence Function (TIF) used in the NC program on the polishing accuracy for optical elements into account

the method how to obtain the optimized TIF based on the aspheric parameters to be polished and polishing pad parameters is proposed. As the key to calculate the TIF of aspheric elements is to obtain accurately the dynamic pressure distribution between polishing pad and mirror

this paper analyzes the pressure distribution between polishing pad and mirror by finite element method and obtains the TIFs in different positions on the aspheric surface by classic Preston equation and planet motion. The variation tendency of the pitch polishing pad in polishing an aspheric element is analyzed in different polishing positions based on the dynamic pressure distribution model. The TIF spot experiment is carried out on an aspheric element with a curvature of 1 000 mm. The result shows that the shape of TIF simulated by the theory introduced in the paper is more similar with that of the actual situation

and the Pearson correlation coefficient reaches 0.977. It concludes that the method can obtain the pressure distribution conveniently by changing the parameter of polishing position and can optimize the TIFs

which provides a theoretical basis for improving polishing efficiency and polishing accuracy.

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references

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