干涉条纹相位锁定系统

鲁森; 杨开明; 朱煜; 王磊杰; 张鸣

doi:10.3788/OPE.20172501.0001

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干涉条纹相位锁定系统

现代应用光学 | 更新时间：2020-07-07

- 干涉条纹相位锁定系统
- Interference fringe phase locking system
- 光学精密工程 2017年25卷第1期页码：1-7
- 作者机构：
  
  清华大学机械工程系摩擦学国家重点实验室 & 精密超精密制造装备及控制北京市重点实验室, 北京 100084
- 作者简介：
  
  [ "鲁森(1987-),男,江苏泰州人,博士研究生,2010年、2013年于东南大学分别获得学士和硕士学位,主要研究方向为扫描干涉光刻系统设计等。E-mail:lus13@mails.tsinghua.edu.cn" ]
  杨开明(1970-),男,云南楚雄人,助理研究员,1992年、1998年于郑州大学分别获得学士和硕士学位,2005年于清华大学获得博士学位,主要研究方向为超精密工件台的运动控制技术等。E-mail:yangkm@tsinghua.edu.cn yangkm@tsinghua.edu.cn
  [ "朱煜(1965-)，男，江苏兴化人，教授，博士生导师，1983年于北京师范大学获得学士学位，1993年、2001年于中国矿业大学分别获得硕士、博士学位，主要研究方向为面向IC制造装备的超精密机械系统设计、超精密测量、超精密运动控制等。E-mail:zhuyu@tsinghua.edu.cn" ]
- 基金信息：
  
  清华大学摩擦学国家重点实验室基金资助项目(No.SKLT12C01)
- DOI：10.3788/OPE.20172501.0001
  中图分类号： O436.1;TN305.7
- 收稿日期：2016-09-05，
  
  录用日期：2016-11-1，
  
  纸质出版日期：2017-01-25
- 稿件说明：
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鲁森, 杨开明, 朱煜, 等. 干涉条纹相位锁定系统[J]. 光学精密工程, 2017,25(1):1-7.

Sen LU, Kai-ming YANG, Yu ZHU, et al. Interference fringe phase locking system[J]. Editorial office of optics and precision engineeri, 2017, 25(1): 1-7.
鲁森, 杨开明, 朱煜, 等. 干涉条纹相位锁定系统[J]. 光学精密工程, 2017,25(1):1-7. DOI： 10.3788/OPE.20172501.0001.

Sen LU, Kai-ming YANG, Yu ZHU, et al. Interference fringe phase locking system[J]. Editorial office of optics and precision engineeri, 2017, 25(1): 1-7. DOI： 10.3788/OPE.20172501.0001.

摘要

干涉曝光系统中干涉条纹的相位漂移会导致曝光对比度降低，为了有效抑制相位漂移，利用声光调制器对干涉光频率进行实时调制。分析了条纹漂移的特点，指出了主要干扰源是0~5 Hz的空气扰动。应用数值分析法得到了条纹漂移量与曝光对比度的关系曲线，并以此为依据提出了条纹锁定精度的目标值。针对所要达到的锁定精度，给出了系统硬件的选型方法，搭建了基于RTX的干涉条纹相位锁定系统。利用闭环辨识的方法得到了系统的参数模型，完成了反馈控制器的设计，最终实现了实时锁定条纹相位的功能。实验结果表明，在400 Hz的控制频率下，干涉锁定系统能够有效抑制0~5 Hz的低频扰动，干涉条纹相位漂移的3

值可以控制在±0.04个条纹周期内，满足干涉光刻的曝光对比度要求。

Abstract

The phase drift leads to low exposure contrast in interference lithography system. In order to effectively suppress the phase drift of interference fringe

an Acousto-Optic Modulator (AOM) was employed to modulate the frequency of interference beam in real time. The characteristic of phase drift was analyzed

indicating that the main disturbance came from air turbulence with frequency within 0~5 Hz. The relationship between phase drift and exposure contrast was deduced by numerical analysis

and the target phase accuracy of fringe locking system was submitted. In terms of the target accuracy

the experiment devices were picked and the experiment system based on RTX was prepared. Finally the parameter model of system was established by closed-loop identification and a feedback controller was designed

thus realizing the fringe locking function. The experiment results indicated that the low-frequency disturbance ranging from 0 to 5 Hz is suppressed efficiently by the proposed fringe locking system under the control frequency of 400 Hz. The 3

value of phase drift is within ±0.04 period

which satisfies the exposure contrast requirements of interference lithography.

关键词

Keywords

references

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