静电场辅助的微压印光刻技术

刘民哲; 王泰升; 李和福; 刘震宇; 陈佐龙; 鱼卫星

doi:10.3788/OPE.20172503.0663

您当前的位置：

首页 >

文章列表页 >

静电场辅助的微压印光刻技术

微纳技术与精密机械 | 更新时间：2020-07-07

- 静电场辅助的微压印光刻技术
- Electrostatic field assisted micro imprint lithography technology
- 光学精密工程 2017年25卷第3期页码：663-671
- 作者机构：
  
  1.中国科学院长春光学精密机械与物理研究所, 吉林长春 130033
  2.中国科学院大学, 北京 100049
  3.中国人民解放军63861部队, 吉林白城 137001
  4.中国科学院西安光学精密机械研究所, 陕西西安 710119
- 作者简介：
  
  [ "刘民哲 (1988-), 男, 山东莱芜人, 博士研究生, 2011年于内蒙古大学获得学士学位, 主要从事微纳加工工艺及微纳器件制作方面的研究工作。E-mail:liuminzhe_ciomp@126.com" ]
  鱼卫星 (1975-)，男，陕西临潼人，研究员，1998年于西北工业大学获得学士学位，2001年于中科院长春光机所获得硕士学位，2004年于新加坡南洋理工大学获得博士学位，主要从事亚波长光学、微纳光学、表面等离子体光学、微细加工技术、三维微纳加工技术等方面的研究。E-mail：yuwx@opt.ac.cn YU Wei-xing, E-mail:yuwx@opt.ac.cn
- 基金信息：
  
  国家自然科学基金资助项目(61475156);国家自然科学基金资助项目(61361166004);国家自然科学基金面上项目(51275504);吉林省基金资助项目(20140519002JH);吉林省科技发展基金资助项目(20140519007JH);深圳市科创委基金资助项目(KQCX2015032416183981)
- DOI：10.3788/OPE.20172503.0663
  中图分类号： O359+.1;O442
- 收稿日期：2016-09-20，
  
  录用日期：2016-10-27，
  
  纸质出版日期：2017-03-25
- 稿件说明：
移动端阅览
刘民哲, 王泰升, 李和福, 等. 静电场辅助的微压印光刻技术[J]. 光学精密工程, 2017,25(3):663-671.

Min-zhe LIU, Tai-sheng WANG, He-fu LI, et al. Electrostatic field assisted micro imprint lithography technology[J]. Optics and precision engineering, 2017, 25(3): 663-671.
刘民哲, 王泰升, 李和福, 等. 静电场辅助的微压印光刻技术[J]. 光学精密工程, 2017,25(3):663-671. DOI： 10.3788/OPE.20172503.0663.

Min-zhe LIU, Tai-sheng WANG, He-fu LI, et al. Electrostatic field assisted micro imprint lithography technology[J]. Optics and precision engineering, 2017, 25(3): 663-671. DOI： 10.3788/OPE.20172503.0663.

摘要

介绍了一种静电场辅助的新型微压印光刻技术，并对其工艺过程进行了深入的理论研究。首先，采用数值仿真软件COMSOL

Multiphysics，建立了静电场辅助的压印光刻瞬态仿真分析模型，讨论了不同时域微结构的演化过程。然后，详细分析了微结构的成型与仿真实验参数的定性关系，发现：适当地减小极板间距、模板凸起结构周期，同时增加模板的凸起高度、初始聚合物薄膜厚度和电压有助于微纳结构的成型。最后，通过仿真实验参数优化，得到了带有31

m中空结构的球冠微结构。与传统压印方法相比，静电场辅助的微压印技术工艺过程简单且成本较低，能够广泛应用于微电子机械系统、光子学、遗传学和组织系统等。

Abstract

In this paper

a new type of micro imprint lithography assisted by electrostatic field was introduced

and an in-depth theoretical research was conducted on its technological process. First

numerical simulation software (COMSOL

Multiphysics) was adopted to establish a transient simulation model for electrostatic filed assisted imprint lithography and discussed the evolution process of micro structure in different time domains. Then a detailed analysis was conducted on the qualitative relationship between the micro structure formation and simulation experiment parameters

during which it was found that properly reducing the polar plate spacing

template bulging period and increasing the bulging height

initial polymer film thickness and voltage were beneficial to formation of the micro-nano structure. Finally

a spherical cap micro structure with 31

m hollow structure was obtained through optimization of the simulation experiment parameters. Compared with traditional imprint method

the electrostatic field assisted micro imprint

which is characterized by simple process and lower cost

can be widely applied to the micro electronic and mechanical system

photonics

genetics and tissue system etc.

关键词

Keywords

references

WHITESIDES G M. The origins and the future of microfluidics [J]. Nature, 2006, 442(442): 368-373.

张运海, 杨皓旻, 孔晨晖.激光扫描共聚焦光谱成像系统[J].光学精密工程, 2014, 22(6):1446-1453.

ZHANG Y H, YANG H M, KONG CH H. Spectral imaging system on laser scanning confocal microscopy [J]. Opt. Precision Eng., 2014, 22(6): 1446-1453. (in chinese)

朱京涛, 岳帅鹏, 涂昱淳, 等.氮气反应溅射制备软X射线Co/Ti多层膜[J].光学精密工程, 2015, 23(1):10-14.

ZHU J T, YUE SH P, TU Y CH, et al.. Preparation of Co/Ti multilayer in soft X-ray region by nitrogen reactive sputtering [J]. Opt. Precision Eng., 2015, 23(1): 10-14.(in chinese)

叶鑫, 倪锐芳, 黄进, 等.自组装法制备的亚波长纳米多孔二氧化硅薄膜[J].光学精密工程, 2015, 23(5):1233-1239.

YE X, NI R F, HUANG J, et al.. Sub-wavelength nano-porous silica anti-reflection coatings fabricated by dip coating method [J]. Opt. Precision Eng., 2015, 23(5): 1233-1239. (in chinese)

TOBEY A C. Wafer stepper steps up yield and resolution in IC lithography [J]. Electronics, 1979, 52(17): 109-112.

HUBRE H, SCHEUNEMANN U. Application of X-ray step-persusing optical alignment for synchrotron based X-ray lithography [J]. Microelectronic Engineering, 1989, 9(1-4): 151-154.

EHRFLD, MUNCHMEYE D. Three-dimensional micro-fabrication using synchrotron radiation [J]. Nulear Instruments and Methods in Physic Research, 1991, 303(3): 523-526.

LEE Y, GOUGH R A, KING T J, et al.. Mcgill. Maskless ion beam lithography system [J]. Microelectronic Engineering, 1999, 46(1-4): 469-472.

KIM H S, KIM Y C, KIM D W, et al.. Low energy electron beam microcolumn lithography [J]. Microelectronic Engineering, 2006, 83 (4-9): 962-967.

ACEVSKA J, STEFKOV G, PETKOVSKA R, et al.. Step and flash imprint lithography template fabrication for emerging market applications [C]. Proceedings of SPIE, 2007, 808(12): 1624-1630.

CHOU S Y, KRAUSS P R, RENSTROM P J. Imprint of sub-25nm vias and trenches in polymers [J]. Appl. Phys. Lett., 1995, 67(67): 3114-3116.

CHOU S Y, KRAUSS P R, RENSTROM P J. Imprint lithography with 25-nanometer resolution [J]. Sci., 1996, 272(272): 85-87.

CHOU S Y, KRAUSS P R, RENSTROM P J. Nanoimprint lithography [J]. J. Vac. Sci. Technol. B., 1996, 14(6): 4129-4133.

KRAUSS P R, CHOU S Y. Nano-compact disks with 400 Gbit/in2 storage density fabricated using nanoimprint lithography and read with proximal probeAppl [J]. Phys. Lett., 1997, 71(21): 3174-3176.

VRATZOV B, FUCHS A, LEMME M, et al.. Large scale ultraviolet-based nanoimprint lithography [J]. J. Vac. Sci. Technol. B, 2003, 21(6): 2760-2764.

LANDIS S, PIROT M, LEE R, et al.. Silicon solar cells efficiency improvement with Nano Imprint Lithography technology [J]. Microelectronic Engineering, 2013, 111(11): 224-228.

SCHAFFER E, THURN-ALBRECHT T, RUSSELL T P, et al.. Electrically induced structure formation and pattern transfer [J]. Nature, 2000, 403(403): 874-877.

RUHI V, ASHUTOSH S, KAJARI K, et al.. Electric field induced instability and pattern formation in thin liquid films [J]. Langmuir, 2005, 21(8): 3710-3721.

LEE S H, JEONG H E, PARK M C, et al.. Fabrication of hollow polymeric microstructures for shear-protecting cell containers [J]. Adv. Mater., 2008, 20(4): 788-792.

LI H, YU W, ZHANG L, et al..Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography [J]. RSC Adv., 2013, 3(29): 11839-11845.

LIU G, YU W, LI H, et al.. Microstructure formation in a thick polymer by electrostatic-induced lithography [J]. J. Micrmesh. Microeng., 2013, 23(3): 35018-35025.

SETHIAN J A. Level Set Methods and Fast Marching Methods [M]. Cambridge: Cambridge University Press, 1999.

浏览量

576

下载量

CSCD

文章被引用时，请邮件提醒。

提交

工具集

关联资源

层析成像技术在冰水两相流参数测量中的应用