X射线衍射光学部件的制备及其光学性能表征

陈宜方

doi:10.3788/OPE.20172511.2779

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X射线衍射光学部件的制备及其光学性能表征

X射线光学 | 更新时间：2020-07-07

- X射线衍射光学部件的制备及其光学性能表征
- Fabrication of diffractive X-ray optics and their performance characterization
- 光学精密工程 2017年25卷第11期页码：2779-2795
- 作者机构：
  
  复旦大学信息科学与工程学院专项集成线路与系统国家重点实验室, 上海 200433
- 作者简介：
  
  [ "陈宜方(1959-), 男, 上海人, 博士, 教授, 1982年于复旦大学物理系获得学士学位, 1985年于上海技术物理研究所获得硕士学位, 1995年于英国牛津大学获得凝聚态物理博士学位, 现为复旦大学信息学院微纳系统中心纳米光刻与应用小组组长, 英国国家物理实验室(NPL)高级客座研究员(2014-2019), Scientific Report杂志编委, Microelectronics Engineering (MEE)杂志亚太主编, 主要从事纳米加工及其在纳米电子学、纳米光子学、超材料和X射线显微透镜等领域的应用。E-mail:yifangchen@fudan.edu.cn" ]
- 基金信息：
  
  自然科学基金面上项目(61574043);上海市科技创新基础研究项目(15JC401000)
- DOI：10.3788/OPE.20172511.2779
  中图分类号： TN305.7;O436.3
- 收稿日期：2017-04-28，
  
  录用日期：2017-5-12，
  
  纸质出版日期：2017-11-25
- 稿件说明：
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陈宜方. X射线衍射光学部件的制备及其光学性能表征[J]. 光学精密工程, 2017,25(11):2779-2795.

Yi-fang CHEN. Fabrication of diffractive X-ray optics and their performance characterization[J]. Optics and precision engineering, 2017, 25(11): 2779-2795.
陈宜方. X射线衍射光学部件的制备及其光学性能表征[J]. 光学精密工程, 2017,25(11):2779-2795. DOI： 10.3788/OPE.20172511.2779.

Yi-fang CHEN. Fabrication of diffractive X-ray optics and their performance characterization[J]. Optics and precision engineering, 2017, 25(11): 2779-2795. DOI： 10.3788/OPE.20172511.2779.

摘要

综述了国内外在纳米加工X射线衍射光学透镜方面的研究现状和最新进展。介绍了作者团队过去三年在这方面做的工作。针对衍射透镜关键技术，研发了具有大高宽比形貌的电子束光刻基础工艺；结合金电镀，提出了纳米尺度波带片的制造技术，并将该工艺成功扩展于分辨率板（Siemens star）和集成光栅型会聚透镜的研制。运用蒙特卡罗模拟和显影动力学，探索了电子束光刻技术所能够实现~100 nm的波带片透镜（其中，100 nm波带片高宽比为16：1）、50~300 nm的分辨率测试板（其中，300 nm测试板高宽比为10：1）和200 nm的会聚透镜（高宽比为10：1）。对所研制的光学部件在同步辐射光源进行了实验表征。结果表明，100 nm波带片聚焦斑尺寸为234 nm，测试板和会聚透镜的光学特性与国外同样光学部件到达同等水平；会聚透镜辐照的均匀性为99%。最后，总结了近几年我国X射线衍射透镜的发展进度，指出了衍射光学部件光学性能发展的最大瓶颈是分辨率与衍射效率相互制约，提出了提高光学部件衍射效率的具体途径，给出了我国X射线衍射透镜技术的未来发展路线图。

Abstract

The present status and recent advances in nanofabrication of X-ray diffractive lenses in domestic and overseas were reviewed. The research and achievements of in the past three years by author's group were introduced. For the key technology of diffractive lenses

the basic processes of electron beam lithography for large aspect ratio profiles in resists was established. By combing with Au electroplating

a solid technical background for nanoscale zone plates was successfully built up and applied to the fabrications of Siemens stars and grating based beam shapers. Furthermore

by applying Monte Carlo simulation and developing dynamics

the aspect ratio (zone height/zone width)limit by electron beam lithography was explored and the physical essence leading to the limit was discussed. A serial of diffractive lenses

such as 50-100 nm zone plates (in which the 100 nm zone plate shows its aspect ratio of 16:1)

50-300 nm Siemens stars(in which the 300 nm Siemens star has the aspect ratio of 10:1)and 200 nm grating based condensers(with the aspect ratio of 10:1)were successfully fabricated. The optical characterizations of these fabricated lenses were measured in Shanghai Light Source

It demonstrates that the focusing spot of 100 nm zone plate is 234 nm. The 300 nm Siemens stars and the condensers fabricated in this work show their optical quality at the world level. The standard deviation of the illuminated intensity is measured to be 1%. Finally

this paper summarizes the development of X-ray diffraction lenses in our country in recent years

and points out that the biggest bottleneck of the development of diffraction optics is the interaction between resolution and diffraction efficiency. It puts forward some specific ways to improve the diffraction efficiency of optics and gives a technical road-map for the lens technique in China in the next five years.

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Keywords

references

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