聚甲基丙烯酸甲酯材质硬X射线组合Kinoform透镜的制作

刘静; 伊福廷; 盛伟繁; 常广才; 张伟伟

doi:10.3788/OPE.20172511.2817

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聚甲基丙烯酸甲酯材质硬X射线组合Kinoform透镜的制作

X射线光学 | 更新时间：2020-07-07

- 聚甲基丙烯酸甲酯材质硬X射线组合Kinoform透镜的制作
- Fabrication of PMMA hard X-ray compound Kinoform lenses
- 光学精密工程 2017年25卷第11期页码：2817-2822
- 作者机构：
  
  中国科学院高能物理研究所, 北京 100049
- 作者简介：
  
  [ "刘静(1987-), 女, 河北唐山人, 博士, 副研究员, 2014年于中国科学院大学获得博士学位, 主要从事微纳加工、X射线微纳聚焦透镜的研究。E-mail:liujing1987@ihep.ac.cn" ]
  张伟伟(1986-), 女, 山东临沂人, 博士, 副研究员, 2013年于北京大学获得博士学位, 主要从事X射线光学及X射线聚焦透镜的研究。E-mail:zhangww@ihep.ac.cn ZHANG Wei-we, E-mail:zhangww@ihep.ac.cn
- 基金信息：
  
  国家自然科学基金青年基金资助项目(11605226);国家自然科学基金青年基金资助项目(11305202)
- DOI：10.3788/OPE.20172511.2817
  中图分类号： O434.19;TN305.7
- 收稿日期：2017-03-22，
  
  录用日期：2017-4-27，
  
  纸质出版日期：2017-11-25
- 稿件说明：
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刘静, 伊福廷, 盛伟繁, 等. 聚甲基丙烯酸甲酯材质硬X射线组合Kinoform透镜的制作[J]. 光学精密工程, 2017,25(11):2817-2822.

Jing LIU, Fu-ting YI, Wei-fan SHENG, et al. Fabrication of PMMA hard X-ray compound Kinoform lenses[J]. Optics and precision engineering, 2017, 25(11): 2817-2822.
刘静, 伊福廷, 盛伟繁, 等. 聚甲基丙烯酸甲酯材质硬X射线组合Kinoform透镜的制作[J]. 光学精密工程, 2017,25(11):2817-2822. DOI： 10.3788/OPE.20172511.2817.

Jing LIU, Fu-ting YI, Wei-fan SHENG, et al. Fabrication of PMMA hard X-ray compound Kinoform lenses[J]. Optics and precision engineering, 2017, 25(11): 2817-2822. DOI： 10.3788/OPE.20172511.2817.

摘要

为提高硬X射线聚焦元件的聚焦性能，利用LIGA（Lithographie，Galvanoformung，Abformung）技术，制备了深度为60 μm的聚甲基丙烯酸甲酯（PMMA）材质硬X射线组合Kinoform透镜（CKL），并获得了良好的面形。制备的CKL以宽度为几个微米的细窄线条为主要结构，包括曲面和直角面形，线条最窄宽度为2 μm。为保证CKL良好的曲面及直角结构，样品制备分为三部分：过渡掩模板的制备，LIGA掩模板的制备，以及最终样品的硬X射线曝光制备。在LIGA掩模板制备过程中，采用制备有纳米柱阵列的硅衬底有效解决了光刻胶脱胶的问题。在最终样品制备过程中，选用分子量较高的PMMA片作衬底，提高了PMMA刚度，有效缓解了细窄线条的倒塌黏连问题，保证了CKL的良好面形。在北京同步辐射光源（BSRF）成像站测试了CKL透镜的性能，结果显示其对于8 keV的X射线，聚焦焦斑的半高全宽（FWHM）为440 nm。

Abstract

To improve the focusing performance of hard X-ray focusing elements

a hard X-ray Compound Kinoform Lens (CKL) based on Polymethyl methacrylate (PMMA) with a depth of 60 μm is fabricated by LIGA(Lithographie

Galvanoformung

Abformung)technology

and its excellent morphology is obtained. The main structure of CKL is a narrow pattern with a few micron widths

including the curve and the rectangular surfaces

and the width of the narrowest pattern is only 2 μm. The fabrication of the CKL is divided into three parts to ensure its excellent morphology:the transitional mask preparation

LIGA mask preparation

and hard X-ray exposure to get the finial samples. The nanopillar arrays on silicon substrate are used to solve the falling-off problem of the photoresist during the LIGA mask preparation. Then the PMMA sample with a high molecular weight is selected as the substrate to improve the rigidity of the PMMA and to relieve the adhesion and collapse of the narrow pattern in the final sample preparation. The focusing performance of CKL is tested at X-ray microscope beam-line of Beijing Synchrotron Radiation Facility (BSRF). The experiment result for an 8 keV X-ray at transmission shows its full-width-at-half-maximum (FWHM) peak size for focusing spot is 440 nm.

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references

YAN H F, CHU Y S, MASER J, et al.. Quantitative X-ray phase imaging at the nanoscale by multilayer Laue lenses[J]. Scientific Reports, 2013, 3:1307.

RAIMONDI L, SVETINA C, MAHNE N, et al.. Status of the K-B bendable optics at FERMI@Elettra FEL[J]. SPIE, 2014, 9208:920804.

LIAO K L, HONG Y L, WANG Q SH, et al.. Analysis of tilted multilayer Laue lens with stochastic layer thickness error[J]. Optics Communications, 2014, 325:111-115.

LIU J P, SHAO J H, ZHANG S CH, et al.. Simulation and experimental study of aspect ratio limitation in Fresnel zone plates for hard-X-ray optics[J]. Applied Optics, 2015, 54(32):9630-9636.

NAZMOV V, MOHR J, GREVING I, et al.. Modified X-ray polymer refractive cross lens with adiabatic contraction and its realization[J]. Journal of Micromechanics and Microengineering, 2015, 25(5):055010.

SCHROERC G, KURAPOVA O, PATOMMEL J, et al.. Hard X-ray nanoprobe based on refractive X-ray lenses[J]. Applied Physics Letters, 2005, 87(12):124103.

YAN H F. X-ray nanofocusing by kinoform lenses:a comparative study using different modeling approaches[J]. Physical Review B, 2010, 81(7):075402.

LIAO K L, HONG Y L, SHENG W F. Optimized short kinoform lenses for hard X-ray nano-focusing[J]. Optics Communications, 2015, 339:53-60.

ARISTOV V, GRIGORIEV M, KUZNETSOV S, et al.. X-ray refractive planar lens with minimized absorption[J]. Applied Physics Letters, 2000, 77(24):4058-4060.

梁静秋, 乐孜纯. PMMA材料制作X射线组合透镜技术研究[J].光学精密工程, 2005, 13(S1):60-64.

LIANG J Q, LE Z CH. Fabrication of PMMA compound X-ray lenses[J]. Opt. Precision Eng., 2005, 13(S1):60-64. (in Chinese)

陈直, 许良, 陈荣昌, 等. Kinoform单透镜的硬X射线聚焦性能[J].物理学报, 2015, 64(16):164104.

CHENG ZH, XU L, CHENG R CH, et al.. Focusing performance of hard X-ray single Kinoform lens[J]. Acta Physica Sinica, 2015, 64(16):164104. (in Chinese)

LIU J, ASHMKHAN M, WANG B, et al.. Fabrication and reflection properties of silicon nanopillars by cesium chloride self-assembly and dry etching[J]. Applied Surface Science, 2012, 258(22):8825-8830.

LIAO Y X, YI F T. Nanopillars by cesium chloride self-assembly and dry etching[J]. Nanotechnology, 2010, 21(46):465302.

LIAO K L, LIU J, LIANG H, et al.. Sub-500 nm hard X ray focusing by compound long kinoform lenses[J]. Applied Optics, 2016, 55(1):38-41.

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