极紫外光刻机多层膜反射镜表面碳污染的清洗

宋源; 卢启鹏; 龚学鹏; 王依; 彭忠琦

doi:10.3788/OPE.20172511.2835

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极紫外光刻机多层膜反射镜表面碳污染的清洗

X射线光学 | 更新时间：2020-07-07

- 极紫外光刻机多层膜反射镜表面碳污染的清洗
- Cleaning of carbon contamination on multilayer optics of EUVL
- 光学精密工程 2017年25卷第11期页码：2835-2844
- 作者机构：
  
  中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室, 吉林长春 130033
- 作者简介：
  
  [ "宋源(1988-), 男, 吉林白山人, 博士, 2011年于贵州大学获得学士学位, 2014年、2016年于中科院大学分别获得硕士、博士学位, 主要从事极紫外多层膜表面碳污染清洗技术的研究。E-mail:songyuan_SHOW@126.com" ]
  卢启鹏(1964-), 男, 黑龙江齐齐哈尔人, 研究员, 博士生导师, 1987年于浙江大学获得学士学位, 1990年于中科院长春光机所获得硕士学位, 主要从事同步辐射光束线关键技术、近红外光谱技术的研究。E-mail:luqipeng@126.com LU Qi-peng, E-mail:luqipeng@126.com
- 基金信息：
  
  国家科技重大专项资助项目(2012ZX02702001);国家自然科学基金资助项目(61404139);应用光学国家重点实验室自主基金资助项目(Y5743FQ158);吉林省重点科技成果转化项目(20150307039GX)
- DOI：10.3788/OPE.20172511.2835
  中图分类号： TN305.7;O484.1
- 收稿日期：2017-03-27，
  
  录用日期：2017-4-10，
  
  纸质出版日期：2017-11-25
- 稿件说明：
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宋源, 卢启鹏, 龚学鹏, 等. 极紫外光刻机多层膜反射镜表面碳污染的清洗[J]. 光学精密工程, 2017,25(11):2835-2844.

Yuan SONG, Qi-peng LU, Xue-peng GONG, et al. Cleaning of carbon contamination on multilayer optics of EUVL[J]. Optics and precision engineering, 2017, 25(11): 2835-2844.
宋源, 卢启鹏, 龚学鹏, 等. 极紫外光刻机多层膜反射镜表面碳污染的清洗[J]. 光学精密工程, 2017,25(11):2835-2844. DOI： 10.3788/OPE.20172511.2835.

Yuan SONG, Qi-peng LU, Xue-peng GONG, et al. Cleaning of carbon contamination on multilayer optics of EUVL[J]. Optics and precision engineering, 2017, 25(11): 2835-2844. DOI： 10.3788/OPE.20172511.2835.

摘要

针对极紫外（EUV）光刻机工作过程中，多层膜反射镜表面沉积碳污染造成的反射率下降问题展开研究，讨论了多层膜反射镜表面碳污染清洗方法。首先描述了在EUV曝光过程中多层膜表面的碳污染形成过程，简单阐述了碳污染对多层膜反射镜的危害。然后从清洗机理、速率以及效果等方面详细描述了多种EUV多层膜表面碳污染清洗方法，分析对比了各清洗技术在清洗速率和效果等方面的优缺点。分析表明：离子体氧和活化氧清洗速率相差不多，可达到2 nm/min，但清洗过程中容易造成表面氧化；等离子体氢和原子氢的清洗速率相对较慢，一般在0.37 nm/min左右，但清洗过程中不易产生氧化。最后针对不同方法应用于在线清洗EUV多层膜反射镜过程中将遇到的问题和难点进行了讨论。

Abstract

This paper focuses on the reflectivity decrease of reflective elements caused by the carbon contamination deposited on multilayers during EUV(Extreme Ultraviolet) lithography working and emphasizes the clear method of carbon contamination deposited on multilayers. The process of carbon contamination deposited on multilayers was elucidated and the damage of carbon contamination on the multilayers was introduced briefly. Several kinds of cleaning methods for carbon contamination deposited on multilayers were described in detail from cleaning mechanism

removing rate and cleaning effect

and their advantages and disadvantages were analyzed. The result indicates that the cleaning rates of plasma oxygen and activated oxygen reach 2 nm/min

but the multilayer surface is easy to be oxidized in cleaning process; and the plasma hydrogen and atomic hydrogen have relatively slow cleaning rates

they are only about 0.37 nm/min

but the multilayer surface is hardly to be oxidized. Moreover

the difficulties of different cleaning methods for X-ray multilayer mirrors in-situ are discussed.

关键词

Keywords

references

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