工作台各速度段激光直写二元图案

张山; 王雷; 吕英俊

doi:10.3788/OPE.20182603.0531

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工作台各速度段激光直写二元图案

现代应用光学 | 更新时间：2020-07-05

- 工作台各速度段激光直写二元图案
- Laser direct writing for binary patterns during accelerating and decelerating motion of scanning stage
- 光学精密工程 2018年26卷第3期页码：531-540
- 作者机构：
  
  1.山东科技大学电气信息系, 山东济南 250031
  2.哈尔滨工业大学超精密光电仪器工程研究所, 黑龙江哈尔滨 150001
- 作者简介：
  
  [ "张山(1979-), 男, 山东威海人, 博士, 讲师, 主要从事激光直写光刻工艺及超精密驱动定位技术的研究。E-mail:zhangshan212@163.com" ]
  [ "王雷(1976-), 男, 黑龙江哈尔滨人, 博士, 教授, 博士生导师, 主要研究方向为超精密微位移驱动控制技术、超精密测量控制技术与仪器工程、基于智能材料的纳米位移执行机构等。E-mail:hit_wanglei@hit.edu.cn" ]
- 基金信息：
  
  山东省自然科学基金资助项目(ZR2014FQ020);国家自然科学基金资助项目(61471224)
- DOI：10.3788/OPE.20182603.0531
  中图分类号： TN249
- 收稿日期：2017-08-10，
  
  录用日期：2017-9-15，
  
  纸质出版日期：2018-03-25
- 稿件说明：
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张山, 王雷, 吕英俊. 工作台各速度段激光直写二元图案[J]. 光学精密工程, 2018,26(3):531-540.

Shan ZHANG, Lei WANG, Ying-jun LÜ. Laser direct writing for binary patterns during accelerating and decelerating motion of scanning stage[J]. Optics and precision engineering, 2018, 26(3): 531-540.
张山, 王雷, 吕英俊. 工作台各速度段激光直写二元图案[J]. 光学精密工程, 2018,26(3):531-540. DOI： 10.3788/OPE.20182603.0531.

Shan ZHANG, Lei WANG, Ying-jun LÜ. Laser direct writing for binary patterns during accelerating and decelerating motion of scanning stage[J]. Optics and precision engineering, 2018, 26(3): 531-540. DOI： 10.3788/OPE.20182603.0531.

摘要

为了进一步提高直角坐标激光的直写效率，提出了一种扫描工作台各速度段进行激光直写二元图案的方法。该方法用扫描工作台的位置反馈脉冲同步触发激光束曝光光刻胶，实现像素点的理想位置曝光；而且依据扫描工作台的运动特性和匀速直写时各像素点获得的曝光量情况，对处于扫描工作台加、减速度段的像素点的曝光强度进行调制，保证需要曝光的像素点对应的每一个位移分辨力距离上所获的曝光量与扫描工作台匀速运动时相同，从而保证扫描工作台速度连续变化的情况下激光直写能获得预期的曝光效果。仿真实验表明：以5 mm×5 mm曝光图案为例，该方法所需的直写时间是传统只在匀速段直写的77.77%；同时配备的声光调制器由16位降为12位时，扫描工作台整个加速段直写产生的曝光量相对误差由0.4%上升为10%。

Abstract

In order to further improve the efficiency of laser direct writing (LDW) in Cartesian coordinates

the exposure process was proposed to proceed in the accelerating and decelerating sections of the scanning stage

while the exposure effect was guaranteed by the following two ways. The pixel exposure data stored in a line buffer were clocked out by the position feedback pulses during the line scan

driving the acousto-optic modulator to obtain the corresponding beam intensity at the exact desired position. According to the kinetic characteristic of scanning stage

the necessary exposure data under uniform motion and minimum exposure intensity

and exposure data of each pixel in the accelerating and decelerating sections of the scanning stage

are modulated to make the distance of each displacement resolution in it exposed as much dose as that in uniform sections. Numerical simulations indicate that

considering an exposure pattern within a 5 mm×5 mm area as an example

the total exposure time with the proposed method is 77.77% of that with exposure only during the scanning stage moving at a constant speed. Meanwhile

the relative error of the exposure dose is increased from 0.4% to 10% when the bit of the acousto-optic modulator is decreased from 16 to 12.

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references

WANG D SH, LUO CH T, XIONG Y Q, et al.. Fabrication technology of the centrosymmetric continuous relief diffractive optical elements[J]. Physics Procedia, 2011, 18:95-99.

HUANG Y Q, HUANG R, LIU Q L, et al.. Realization of Ⅲ-V semiconductor periodic nanostructures by laser direct writing technique[J]. Nanoscale Research Letters, 2017, 12:12.

TONG Q C, LUONG M H, TRAN T M, et al.. Realization of desired plasmonic structures via a direct laser writing technique[J]. Journal of Electronic Materials, 2017, 46(6):3695-3701.

LUO ZH, WANG C, YIN K, et al.. Rapid fabrication of cylindrical microlens array by shaped femtosecond laser direct writing[J]. Applied Physics A, 2016, 122(7):633.

冯晓国, 张舸, 汤洋.薄膜型金属网栅的电磁屏蔽特性[J].光学精密工程, 2015, 23(3):686-691.

FENG X G, ZHANG G, TANG Y. Electromagnetic shielding properties of metallic mesh coatings[J]. Opt. Precision Eng., 2015, 23(3):686-691. (in Chinese)

刘东旭, 夏虹, 孙允陆, 等.飞秒激光直写生物凝胶模板原位合成纳米粒子[J].中国光学, 2014, 7(4):608-615.

LIU D X, XIA H, SUN Y L, et al.. Femtosecond laser direct writing bio-gel template for in situ synthesis of nanoparticles[J]. Chinese Optics, 2014, 7(4):608-615. (in Chinese)

蔡志祥, 曾晓雁.激光微熔覆技术的发展及应用[J].中国光学与应用光学, 2010, 3(5):405-414.

CAI ZH X, ZENG X Y. Development and applications of laser micro cladding[J]. Chinese Journal of Optics and Applied Optics, 2010, 3(5):405-414. (in Chinese)

陈林森, 邵洁, 王雪辉, 等.一种二元整形元件激光直写方法的实验研究[J].光子学报, 2005, 34(3):346-349.

CHEN L S, SHAO J, WANG X H, et al.. A new laser direct writing method of binary beam-shaping element[J]. Acta Photonica Sinica, 2005, 34(3):346-349. (in Chinese)

YU Y H, TIAN ZH N, JIANG T, et al.. Fabrication of large-scale multilevel phase-type Fresnel zone plate arrays by femtosecond laser direct writing[J]. Optics Communications, 2016, 362:69-72.

GALE M T, ROSSI M, PEDERSEN J, et al.. Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresists[J]. Optical Engineering, 1994, 33(11):3556-3566.

POLESHCHUK A G, CHURIN E G, KORONKE VICH V P, et al.. Polar coordinate laser pattern generator for fabrication of diffractive optical elements with arbitrary structure[J]. Applied Optics, 1999, 38(8):1295-1301.

HARUNA M, YOSHIDA S, TODA H, et al.. Laser-beam writing system for optical integrated circuits[J]. Applied Optics, 1987, 26(21):4587-4592.

BECKER H, CASPARY R, CTOEPFER C, et al.. Low-cost direct writing lithography system for the sub-micron range[J]. Journal of Modern Optics, 1997, 44(9):1715-1723.

邱传凯, 杜春雷, 侯德胜.激光直写光刻工艺技术研究[J].光电工程, 1997, 24(S1):36-40, 45.

QIU CH K, DU CH L, HOU D SH. Research on the technologies for laser direct writing[J]. Opto-Electronic Engineering, 1997, 24(S1):36-40, 45. (in Chinese)

RUNG S, REXHEPI M, BISCHOFF C, et al.. Laserscribing of thin films using top-hat laser beam profiles[J]. Journal of Laser Micro/Nanoengineering, 2013, 8(3):309-314.

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