刀口半影最小化的光刻机扫描狭缝研究

林栋梁; 张方; 黄惠杰

doi:10.3788/OPE.20182605.1046

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刀口半影最小化的光刻机扫描狭缝研究

现代应用光学 | 更新时间：2020-08-13

- 刀口半影最小化的光刻机扫描狭缝研究
- Research of scanning slit with minimal penumbra of blade's edge in lithography
- 光学精密工程 2018年26卷第5期页码：1046-1053
- 作者机构：
  
  1.中国科学院上海光学精密机械研究所信息光学与光电技术试验室, 上海 201800
  2.中国科学院大学, 北京 100049
- 作者简介：
  
  [ "林栋梁(1984-), 男, 安徽潜山人, 博士研究生, 助理研究员, 2009年于上海大学精密仪器及机械专业获得硕士学位, 主要从事光学精密仪器设计、高NA光学光刻技术等方面的研究。E-mail:LDLQWE@126.com" ]
  [ "黄惠杰(1966-), 男, 江苏南通人, 博士生导师, 研究员, 1989年于浙江大学光学仪器工程学系获得学士学位, 1992年、2005年于中国科学院上海光学精密机械研究所分别获得硕士和博士学位, 主要从事精密光电测控技术、光学生物传感技术、光学检测技术、高NA光学光刻技术等方面的研究。E-mail:huanghuijie@siom.ac.cn" ]
- 基金信息：
  
  上海市科技人才计划资助项目(17YF1429500);政府间国际科技创新合作重点专项资助项目(2016YFE0110600);上海市国际科技合作基金资助项目(16520710500)
- DOI：10.3788/OPE.20182605.1046
  中图分类号： TN23;TN305.7
- 收稿日期：2017-10-10，
  
  录用日期：2017-12-6，
  
  纸质出版日期：2018-05-25
- 稿件说明：
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林栋梁, 张方, 黄惠杰. 刀口半影最小化的光刻机扫描狭缝研究[J]. 光学精密工程, 2018,26(5):1046-1053.

Dong-liang LIN, Fang ZHANG, Hui-jie HUANG. Research of scanning slit with minimal penumbra of blade's edge in lithography[J]. Optics and precision engineering, 2018, 26(5): 1046-1053.
林栋梁, 张方, 黄惠杰. 刀口半影最小化的光刻机扫描狭缝研究[J]. 光学精密工程, 2018,26(5):1046-1053. DOI： 10.3788/OPE.20182605.1046.

Dong-liang LIN, Fang ZHANG, Hui-jie HUANG. Research of scanning slit with minimal penumbra of blade's edge in lithography[J]. Optics and precision engineering, 2018, 26(5): 1046-1053. DOI： 10.3788/OPE.20182605.1046.

摘要

扫描狭缝是步进扫描光刻机中控制曝光剂量的重要单元，而扫描狭缝产生过大的刀口半影会影响曝光性能。首先，根据步进扫描光刻机照明原理，通过分析掩模面上光强分布与扫描狭缝刀口厚度及位置的相对关系，推导出掩模面上刀口半影宽度的计算公式，同时针对数值孔径NA为0.75的光刻机照明系统模型分别对非共面和共面扫描狭缝在掩模面上的刀口半影进行仿真分析；研制了一种四刀口共面的高精度扫描狭缝装置，不仅满足步进扫描光刻机的同步性能需求，并且有效减小了

向和

向的刀口半影；最后对所研制的扫描狭缝动态性能以及掩模面上实际刀口半影进行了测试。结果表明，当最大扫描速度达到470 mm/s时，扫描刀口动态跟随误差始终在±30 μm以内，同时两个方向的刀口半影均不超过0.5 mm，满足90 nm分辨率步进扫描光刻机的需求。

Abstract

Scanning slit is an important element for controlling exposure dose in step-and-scan lithography. Too large a penumbra of the blade's edge in scanning slit could affect the exposure performance. Firstly

according to the illumination principle of a step-and-scan lithography

the calculation formula of the penumbra of the blade's edge at the reticle plane was derived by analyzing the relationship between the intensity distribution of the reticle and the thickness and location of the blades in the scanning slit. The theoretical value of the penumbra of the coplanar and noncoplanar blade's edges at the reticle plane was verified using the simulating light model of a 0.75 NA lithography. Secondly

a high-accuracy scanning slit apparatus with four coplanar blades was developed

which not only meets the synchronization performance requirements of the step-and-scan lithography

but also reduces the penumbra of the blade's edges in the

and

-direction. Finally

the dynamic performance of the scanning blades and the actual penumbra of the blade's edges at the reticle plane were also experimentally tested. The test results indicate that when the scanning speed reaches 470 mm/s

the dynamic position error of the blade is within ±30 μm and the penumbra of all edges does not exceed 0.5 mm and meets the requirements of the 90 nm step-and-scan lithography.

关键词

Keywords

references

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