基于离子束溅射Ta<sub>2</sub>O<sub>5</sub>薄膜的紫外吸收膜技术

姜玉刚; 刘华松; 陈丹; 王利栓; 李士达; 刘丹丹; 姜承慧; 季一勤

doi:10.3788/OPE.20192703.0527

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基于离子束溅射Ta₂O₅薄膜的紫外吸收膜技术

现代应用光学 | 更新时间：2020-08-13

- 基于离子束溅射Ta₂O₅薄膜的紫外吸收膜技术
- Ultraviolet absorption film technology based on ion beam sputtering Ta₂O₅ thin films
- 光学精密工程 2019年27卷第3期页码：527-532
- 作者机构：
  
  1.天津津航技术物理研究所天津市薄膜光学重点实验室，天津 300308
  2.光电材料智能表面织构技术联合实验室，天津 300308
- 作者简介：
  
  [ "姜玉刚(1985-)，男，安徽霍邱人，博士，高级工程师，2011年于哈尔滨工业大学获得博士学位，主要从事低损耗光学薄膜及固体激光薄膜的设计、制备与表征技术的研究。E-mail:jygang_4089@163.com" ]
  [ "刘华松(1980-)，男，辽宁阜新人，博士，研究员，2011年于同济大学获得博士学位，主要从事光学薄膜的设计、制备与表征技术，以及光学薄膜材料物理方面的研究。E-mail: liuhuasong@hotmail.com" ]
- 基金信息：
  
  国家自然科学基金资助项目(61705165);国家自然科学基金资助项目(61775167);国家自然科学基金资助项目(51702231);国家自然科学基金资助项目(61235011);天津市自然科学基金资助项目(18JCZDJC37900)
- DOI：10.3788/OPE.20192703.0527
  中图分类号： O484.4
- 收稿日期：2018-10-30，
  
  录用日期：2018-12-20，
  
  纸质出版日期：2019-03-15
- 稿件说明：
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姜玉刚, 刘华松, 陈丹, 等. 基于离子束溅射Ta₂O₅薄膜的紫外吸收膜技术[J]. 光学精密工程, 2019,27(3):527-532.

Yu-gang JIANG, Hua-song LIU, Dan CHEN, et al. Ultraviolet absorption film technology based on ion beam sputtering Ta₂O₅ thin films[J]. Optics and precision engineering, 2019, 27(3): 527-532.
姜玉刚, 刘华松, 陈丹, 等. 基于离子束溅射Ta₂O₅薄膜的紫外吸收膜技术[J]. 光学精密工程, 2019,27(3):527-532. DOI： 10.3788/OPE.20192703.0527.

Yu-gang JIANG, Hua-song LIU, Dan CHEN, et al. Ultraviolet absorption film technology based on ion beam sputtering Ta₂O₅ thin films[J]. Optics and precision engineering, 2019, 27(3): 527-532. DOI： 10.3788/OPE.20192703.0527.

摘要

为获得高性能紫外激光薄膜元件，急需研制紫外高反射吸收薄膜，实现吸收损耗的精确测量。本文采用离子束溅射技术，通过调控氧气流量实现了具有不同吸收的Ta

薄膜的制备。以Ta

薄膜作为高折射率材料，设计了355 nm的紫外高反射吸收薄膜。采用离子束溅射沉积技术，在熔融石英基底上制备了355 nm的吸收薄膜，对于

=5%的紫外吸收光谱，在355 nm的透射率、反射率和吸收率分别为0.1%，95.0%和4.9%；对于

=12%的紫外吸收光谱，在355 nm的透射率、反射率和吸收率分别为0.1%，87.4%和12.5%。实验结果表明，采用离子束溅射沉积技术，可以实现不同吸收率的355 nm高反射吸收薄膜的制备，对于基于光热偏转测量技术的紫外光学薄膜弱吸收测量仪的定标具有重要的意义。

Abstract

To obtain a high-performance ultraviolet laser thin film

developing one that achieves accurate measurement of absorption loss is essential. In this study

thin films with different absorptivities were deposited on fused quartz substrates using an ion-beam sputtering technique and by changing the oxygen flow. Ta

thin films were used as high refractive index materials

and UV high reflectance absorption thin films of 355 nm were developed. Two types of 355-nm absorption thin films were prepared on fused quartz substrates using an ion-beam sputtering deposition technique. The transmissivity

reflectivity

and absorptivity at a wavelength of 355 nm were 0.1%

95.0%

and 4.9% for 5% UV absorption spectra

respectively

whereas those at the wavelength of 355 nm were 0.1%

87.4% and 12.5% for 12% UV absorption spectra

respectively. The experimental results show that the preparation of high reflectance thin films of 355 nm with different absorptivity can be prepared by ion-beam sputtering deposition. This is of great significance to the calibration of UV thin film weak absorption measuring instruments based on photothermal deflection measurement technology.

关键词

Keywords

references

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基于离子束溅射Ta2O5薄膜的紫外吸收膜技术

Ultraviolet absorption film technology based on ion beam sputtering Ta2O5 thin films

DOI：10.3788/OPE.20192703.0527

摘要

Abstract

关键词

Keywords

references

基于离子束溅射Ta₂O₅薄膜的紫外吸收膜技术

Ultraviolet absorption film technology based on ion beam sputtering Ta₂O₅ thin films