复杂图案轮廓曝光版图的生成及工艺实现

段辉高; 戴彭; 张轼; 陈艺勤; 石惠民; 林子豪; 周艳明

doi:10.3788/OPE.20192703.0584

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复杂图案轮廓曝光版图的生成及工艺实现

微纳技术与精密机械 | 更新时间：2020-08-13

- 复杂图案轮廓曝光版图的生成及工艺实现
- Realization of complex patterns via "sketch and peel" lithography
- 光学精密工程 2019年27卷第3期页码：584-593
- 作者机构：
  
  1.湖南大学机械与运载工程学院，湖南长沙 410082
  2.湖南大学物理与微电子科学学院，湖南长沙 410082
- 作者简介：
  
  [ "段辉高(1982-)，男，湖南衡阳人，教授，博士生导师，2004年、2010年于兰州大学分别获得学士、博士学位，主要从事微纳制造、微纳光学器件的精密和超精密加工等方面的研究。E-mail:duanhg@hnu.edu.cn" ]
  [ "戴彭(1992-)，男，湖南岳阳人，硕士研究生，2015年于湘潭大学获得学士学位，主要从事微纳光学方面的研究。E-mail: pengdai@hnu.edu.cn" ]
- 基金信息：
  
  国家自然科学基金优秀青年基金资助项目(51722503)
- DOI：10.3788/OPE.20192703.0584
  中图分类号： TN305.7
- 收稿日期：2018-10-09，
  
  录用日期：2018-11-27，
  
  纸质出版日期：2019-03-15
- 稿件说明：
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段辉高, 戴彭, 张轼, 等. 复杂图案轮廓曝光版图的生成及工艺实现[J]. 光学精密工程, 2019,27(3):584-593.

Hui-gao DUAN, Peng DAI, Shi ZHANG, et al. Realization of complex patterns via "sketch and peel" lithography[J]. Optics and precision engineering, 2019, 27(3): 584-593.
段辉高, 戴彭, 张轼, 等. 复杂图案轮廓曝光版图的生成及工艺实现[J]. 光学精密工程, 2019,27(3):584-593. DOI： 10.3788/OPE.20192703.0584.

Hui-gao DUAN, Peng DAI, Shi ZHANG, et al. Realization of complex patterns via "sketch and peel" lithography[J]. Optics and precision engineering, 2019, 27(3): 584-593. DOI： 10.3788/OPE.20192703.0584.

摘要

轮廓曝光技术可大幅提高跨尺度结构电子束直写的加工效率，但对于复杂图案，前期人工绘制曝光版图的过程费时费力。为了进一步提高版图生成效率，本文提出一种利用边界追踪算法提取数字图像轮廓并将它转换为曝光版图的方法。首先，通过图像灰度化以及Otsu自适应阈值分割法将图像转换为二值图像。接着，使用MATLAB bwboundaries边界追踪函数追踪二值图像边界。最后，利用GDS工具箱将图像边界转换为曝光版图。实验结果表明，本工作提出的方法可以有效地提取树叶、数字及动物等复杂图案边缘并将它们转换为版图进行后续曝光。通过制备“枫叶”图形证实利用本文方法生成的版图在轮廓曝光中可获得从纳米尺度到亚毫米尺度下的跨尺度、高保真度图形，通过制备50 μm和100 μm等不同大小、不同复杂程度的金结构证实了此方法在微纳制造中的通用性。

Abstract

"Sketch and Peel" lithography (SPL) has demonstrated the potential to improve the efficiency of electron beam direct writing. However

it is time-consuming to design exposure layouts for complex patterns. In this study

we proposed a method to generate SPL layouts for complex patterns using an edge tracing algorithm to extract digital image contours. First

the color image was converted to a binary image by image graying and the Otsu adaptive threshold segmentation algorithm. Then

the boundary of the binary image was traced by the MATLAB bwboundaries function. Finally

the MATLAB GDS toolbox was utilized to transform the traced boundary to layouts for exposure. The experiments confirmed that the proposed method is effective for extracting the boundaries of images and converting them to layouts. As shown by fabricating a maple leaf-like pattern

the generated layout still maintains its high graphic fidelity when applied to SPL. The versatility of the proposed method for micro-nanomanufacturing was also verified by fabricating other complex patterns of different sizes and different geometries.

关键词

Keywords

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