离子后处理对TiO<sub>2</sub>光学薄膜及损伤特性的影响

毛思达; 邹永刚; 范杰; 兰云萍; 王海珠; 张家斌; 董家宁; 马晓辉

doi:10.3788/OPE.20192707.1451

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离子后处理对TiO₂光学薄膜及损伤特性的影响

现代应用光学 | 更新时间：2020-08-13

- 离子后处理对TiO₂光学薄膜及损伤特性的影响
- Influence of plasma treatment on optical and damage properties of TiO₂ thin films
- 光学精密工程 2019年27卷第7期页码：1451-1457
- 作者机构：
  
  长春理工大学高功率半导体激光国家重点实验室, 吉林长春 130022
- 作者简介：
  
  [ "毛思达(1993-), 男, 吉林长春人, 硕士研究生, 2016年于长春理工大学获得学士学位, 主要研究方向为后处理工艺对薄膜影响的研究.。E-mail:964646323@qq.com" ]
  邹永刚(1982-), 男, 吉林长春人, 研究员, 博士生导师, 2009年于吉林大学获得得博士学位, 2013-2014年于美国加州大学洛杉矶分校进行了为期一年的交流学习, 主要研究领域为光电子技术及应用, 半导体光电子器件与技术、高功率半导体激光、通讯激光、高速锁模激光、VCSEL等。E-mail:zouyg@cust.edu.cn ZOU Yong-gang, E-mail:zouyg@cust.edu.cn
- 基金信息：
  
  吉林省科技发展计划资助项目(20180519018JH);国家自然基金青年基金资助项目(21707010);吉林省优秀青年基金资助项目(20180520194JH)
- DOI：10.3788/OPE.20192707.1451
  中图分类号： O484.4
- 收稿日期：2018-11-27，
  
  录用日期：2019-1-6，
  
  纸质出版日期：2019-07-15
- 稿件说明：
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毛思达, 邹永刚, 范杰, 等. 离子后处理对TiO₂光学薄膜及损伤特性的影响[J]. 光学精密工程, 2019,27(7):1451-1457.

Si-da MAO, Yong-gang ZOU, Jie FAN, et al. Influence of plasma treatment on optical and damage properties of TiO₂ thin films[J]. Optics and precision engineering, 2019, 27(7): 1451-1457.
毛思达, 邹永刚, 范杰, 等. 离子后处理对TiO₂光学薄膜及损伤特性的影响[J]. 光学精密工程, 2019,27(7):1451-1457. DOI： 10.3788/OPE.20192707.1451.

Si-da MAO, Yong-gang ZOU, Jie FAN, et al. Influence of plasma treatment on optical and damage properties of TiO₂ thin films[J]. Optics and precision engineering, 2019, 27(7): 1451-1457. DOI： 10.3788/OPE.20192707.1451.

摘要

为了进一步提高TiO

薄膜的光学特性和激光损伤阈值

采用电子束蒸发技术在K9玻璃上沉积了单层TiO

薄膜

并用Ar/O混合等离子体对样品进行后处理。通过研究薄膜光谱特性、表面缺陷密度、薄膜表面形貌、薄膜损伤阈值以及薄膜损伤形貌

分析了等离子体后处理时间对TiO

薄膜激光损伤特性的影响。实验结果表明

随着等离子体后处理时间的增加

薄膜折射率及致密度提高

物理厚度减少

表面粗糙度下降

表面缺陷密度先减少后增加; 在1 064 nm激光辐射下

TiO

薄膜的激光损伤阈值从未经等离子后处理的5.6 J/cm

提升至后处理20 min的9.65 J/cm

提升幅度高达72.3%

因此能够更广泛更稳定地应用在激光器中。

Abstract

To improve the optical properties and laser damage threshold of TiO

films and to ensure their wider use and greater stability in lasers

TiO

films were deposited on K9 glass using electron beam evaporation technology

and the samples were post-treated with Ar/O mixed plasma. The effects of plasma post-treatment time on the laser damage characteristics of TiO

thin films were analyzed by measuring the film spectral characteristics

surface defect density

surface topography

damage threshold

and damage topography. The experimental results showed that the refractive index and fill density of the films increased with increasing post-treatment time

whereas the physical thickness and surface roughness decreased. In addition

the surface defect density first decreased and then increased. After a 20-min post-treatment

the LIDT of the TiO

film samples increased from 5.6 to 9.65 J/cm

under a 1 064-nm laser irradiation

representing an increase of 72.3%.

关键词

Keywords

references

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离子后处理对TiO2光学薄膜及损伤特性的影响

Influence of plasma treatment on optical and damage properties of TiO2 thin films

DOI：10.3788/OPE.20192707.1451

摘要

Abstract

关键词

Keywords

references

离子后处理对TiO₂光学薄膜及损伤特性的影响

Influence of plasma treatment on optical and damage properties of TiO₂ thin films