面向大面积微结构批量化制造的复合压印光刻

兰红波; 刘明杨; 郭良乐; 许权

doi:10.3788/OPE.20192707.1516

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面向大面积微结构批量化制造的复合压印光刻

微纳技术与精密机械 | 更新时间：2020-08-13

- 面向大面积微结构批量化制造的复合压印光刻
- Composite imprint lithography for mass producing large-area microstructures
- 光学精密工程 2019年27卷第7期页码：1516-1527
- 作者机构：
  
  青岛理工大学山东省增材制造工程技术研究中心，山东青岛 266520
- 作者简介：
  
  [ "兰红波 (1970-)，男，山东临沂人，博士，教授，博士生导师，2004年于西安交通大学获得博士学位，山东省增材制造工程技术研究中心主任，青岛市3D打印工程研究中心主任，主要从事微纳尺度3D打印、增材制造、大面积纳米压印光刻、微纳制造等研究与开发。E-mail：hblan99@126.com" ]
  [ "刘明杨 (1994-)，男，山东菏泽人，硕士研究生，主要从事大面积纳米压印与微纳制造方面的研究。E-mail：993793312@qq.com" ]
- 基金信息：
  
  国家自然科学基金资助项目(51775288)
- DOI：10.3788/OPE.20192707.1516
  中图分类号： TN305.7
- 收稿日期：2019-04-15，
  
  录用日期：2019-5-27，
  
  纸质出版日期：2019-07-15
- 稿件说明：
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兰红波, 刘明杨, 郭良乐, 等. 面向大面积微结构批量化制造的复合压印光刻[J]. 光学精密工程, 2019,27(7):1516-1527.

Hong-bo LAN, Ming-yang LIU, Liang-le GUO, et al. Composite imprint lithography for mass producing large-area microstructures[J]. Optics and precision engineering, 2019, 27(7): 1516-1527.
兰红波, 刘明杨, 郭良乐, 等. 面向大面积微结构批量化制造的复合压印光刻[J]. 光学精密工程, 2019,27(7):1516-1527. DOI： 10.3788/OPE.20192707.1516.

Hong-bo LAN, Ming-yang LIU, Liang-le GUO, et al. Composite imprint lithography for mass producing large-area microstructures[J]. Optics and precision engineering, 2019, 27(7): 1516-1527. DOI： 10.3788/OPE.20192707.1516.

摘要

为了解决在大尺寸非平整刚性衬底和易碎衬底上高效低成本批量化制造大面积微纳结构这一难题，提出一种面向大面积微结构批量化制造的复合微纳压印光刻工艺。阐述了复合压印光刻的基本原理和工艺流程，通过实验揭示了主要工艺参数(覆模速度、压印力、压印速度、固化时间)对于压印结构的影响及规律。最后，利用课题组自主研发的复合压印光刻机，并结合优化的工艺参数，在3种不同的硬质基材(玻璃、PMMA、蓝宝石)上实现了微尺度柱状结构(最大图形区域为132 mm×119 mm)、微尺度光栅结构(最大直径为15.24 cm的圆形区域)和纳尺度柱状结构(图形区域为47 mm×47 mm)的大面积微纳结构制造。研究结果表明，提出的复合微纳米压印工艺为大面积微纳结构宏量可控制备、以及大尺寸非平整刚性衬底/易碎衬底大面积图形化提供了一种全新的解决方案，具有广阔的工业化应用前景。

Abstract

To implement low-cost mass production of large-area micro/nanostructures on large-size rigid and fragile substrates

this study presents a novel composite nanoimprint lithography technique. First

the basic principle and process of the composite imprint lithography are described. Then

the effects and rules of the key process parameters (i.e.

spreading speed of the flexible mold

imprint force

imprint speed

and curing time) on the imprinted patterns are revealed by a series of experiments. Finally

through a combination of the home-made composite imprinter and optimized process parameters

four typical cases are illustrated. We fabricated large-area micro/nanostructures on three rigid substrates (glass

polymethyl methacrylate

and sapphire)

including microscale columnar structures (the largest graphic area is 132 mm× 119 mm)

a microscale grating structure (the largest area is 6-inch round)

and a nanoscale columnar structure (the graphic area is 47 mm× 47 mm). Experimental results show that the presented composite imprint lithography technique provides a novel way for the macroscopic quantity preparation of large-area micro/nanostructures and large-area patterning on rigid or fragile substrates

thus presenting a bright prospect for industrial applications.

关键词

Keywords

references

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面向大面积微结构批量化制造的复合压印光刻技术的研究

大面积纳米压印光刻晶圆级复合软模具制造