面向浸没式光刻机的超精密光学干涉式光栅编码器位移测量技术综述

王磊杰; 张鸣; 朱煜; 叶伟楠; 杨富中

doi:10.3788/OPE.20192709.1909

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面向浸没式光刻机的超精密光学干涉式光栅编码器位移测量技术综述

微纳技术与精密机械 | 更新时间：2020-08-13

- 面向浸没式光刻机的超精密光学干涉式光栅编码器位移测量技术综述
- Review of ultra-precision optical interferential grating encoder displacement measurement technology for immersion lithography scanner
- 光学精密工程 2019年27卷第9期页码：1909-1918
- 作者机构：
  
  清华大学机械工程系摩擦学国家重点实验室&精密超精密制造装备及控制北京市重点实验室, 北京 100084
- 作者简介：
  
  [ "王磊杰(1988-)，男，河南周口人，博士，助理研究员，2010年于中国矿业大学(北京)获得学士学位，2016年于清华大学获得博士学位，主要研究方向为基于扫描干涉光刻的大口径光栅制造技术、超精密光栅编码器位移测量技术和超精密激光编码器位移测量技术。E-mail:wang-lj66@mail.tsinghua.edu.cn" ]
  [ "张鸣(1973-)，男，吉林扶余人，副研究员，1996年于北京科技大学获得学士学位，1999年于中国运载火箭研究院13所获得硕士学位，2005年于清华大学获得博士学位，主要研究方向为高端光刻机超精密工件台的研制，涉及超精密工件台系统设计，结构设计、超精密制造工艺、高性能驱动、超精密测量及超精密环境保障等工件台研发的核心领域。E-mail: zhangming@mail.tsinghua.edu.cn" ]
- 基金信息：
  
  国家重大科技专项(02专项)资助项目(2017ZX02102004，2018ZX02101003)
- DOI：10.3788/OPE.20192709.1909
  中图分类号： TH741
- 收稿日期：2019-05-02，
  
  录用日期：2019-6-13，
  
  纸质出版日期：2019-09-15
- 稿件说明：
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王磊杰, 张鸣, 朱煜, 等. 面向浸没式光刻机的超精密光学干涉式光栅编码器位移测量技术综述[J]. 光学精密工程, 2019,27(9):1909-1918.

Lei-jie WANG, Ming ZHANG, Yu ZHU, et al. Review of ultra-precision optical interferential grating encoder displacement measurement technology for immersion lithography scanner[J]. Optics and precision engineering, 2019, 27(9): 1909-1918.
王磊杰, 张鸣, 朱煜, 等. 面向浸没式光刻机的超精密光学干涉式光栅编码器位移测量技术综述[J]. 光学精密工程, 2019,27(9):1909-1918. DOI： 10.3788/OPE.20192709.1909.

Lei-jie WANG, Ming ZHANG, Yu ZHU, et al. Review of ultra-precision optical interferential grating encoder displacement measurement technology for immersion lithography scanner[J]. Optics and precision engineering, 2019, 27(9): 1909-1918. DOI： 10.3788/OPE.20192709.1909.

摘要

超精密平面光栅编码器位移测量技术是32~7 nm节点浸没式光刻机的核心技术。通过分析浸没式光刻机平面光栅位置系统的需求和布局，提出了光刻机专用超精密平面光栅编码器的基本需求。针对现有的光栅编码器，开展了基本测量光路方案、相位探测方案、分辨率增强光路方案、离轴/转角允差光路方案、死程误差抑制光路方案的综述分析，提出了现有设计方案面向光刻机应用所需要解决的关键问题。面向亚纳米级测量精度的需求，针对光栅编码器的仪器误差，对周期非线性误差、死程误差、热漂移误差和波前畸变误差进行了综述分析，提出了平面光栅编码器实现亚纳米精度所需要解决的关键问题。本综述为光刻机专用超精密平面光栅编码器的研制提供了参考。

Abstract

The ultra-precision grid encoder is the key technology of the immersion lithography scanner for 32-7 nm node. Firstly

by analyzing the requirements and layout of the grid encoder position measurement system of the immersion lithography scanner

the basic requirement of a special grid encoder for the scanner is proposed. Secondly

for the present grating encoder

research on the basic optical path

phase detection

resolution multiplication

off-axis/rotation tolerance

and dead-path restrain scheme is reviewed and analyzed. Then

the key problems of the present scheme in the application of the lithography scanner are proposed. Thirdly

to address the required nanometer accuracy for the instrumental error of the grid encoder

the research on nonlinearity

dead-path

thermal drift

and wave-front distortion error are reviewed and analyzed; and the key problems to achieve sub-nanometer accuracy for the grid encoder are proposed. Finally

the above review is summarized

which can serve as a reference for the special grid encoder of immersion lithography scanner.

关键词

Keywords

references

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