酸碱度对磁流变抛光去除作用的调节机制

李晓媛; 叶敏恒; 刘佳保; 田东; 张云飞; 董会; 王超

doi:10.3788/OPE.20192712.2602

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酸碱度对磁流变抛光去除作用的调节机制

微纳技术与精密机械 | 更新时间：2020-07-09

- 酸碱度对磁流变抛光去除作用的调节机制
- Influence of pH value on removal effect of fused silica during magnetorheological finishing
- 光学精密工程 2019年27卷第12期页码：2602-2608
- 作者机构：
  
  中国工程物理研究院机械制造工艺研究所，四川绵阳 621900
- 作者简介：
  
  [ "李晓媛(1987-)，女，四川遂宁人，硕士，工程师，2012年于重庆大学获得硕士学位，主要从事光学元件超精密抛光方面的研究。E-mail:lxy20056482@126.com" ]
  [ "王超(1982-)，男，湖北武汉人，博士，高级工程师，2011年于哈尔滨工业大学获得博士学位，主要从事磁性功能材料设计，超精密制造中材料去除机制等方面的研究。E-mail: wangchaohit@126.com" ]
- 基金信息：
  
  国家自然科学基金资助项目(51575501);核科学挑战计划(JCKY2016212A506);科技部04重大专项(2017ZX04022001);中国工程物理研究院超精密加工技术重点实验室基金资助项目(K1155)
- DOI：10.3788/OPE.20192712.2602
  中图分类号： TG580.692
- 收稿日期：2019-07-26，
  
  录用日期：2019-8-27，
  
  纸质出版日期：2019-12-25
- 稿件说明：
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李晓媛, 叶敏恒, 刘佳保, 等. 酸碱度对磁流变抛光去除作用的调节机制[J]. 光学精密工程, 2019,27(12):2602-2608.

Xiao-yuan LI, Min-heng YE, Jia-bao LIU, et al. Influence of pH value on removal effect of fused silica during magnetorheological finishing[J]. Optics and precision engineering, 2019, 27(12): 2602-2608.
李晓媛, 叶敏恒, 刘佳保, 等. 酸碱度对磁流变抛光去除作用的调节机制[J]. 光学精密工程, 2019,27(12):2602-2608. DOI： 10.3788/OPE.20192712.2602.

Xiao-yuan LI, Min-heng YE, Jia-bao LIU, et al. Influence of pH value on removal effect of fused silica during magnetorheological finishing[J]. Optics and precision engineering, 2019, 27(12): 2602-2608. DOI： 10.3788/OPE.20192712.2602.

摘要

随着磁流变抛光技术在超精密加工领域的应用需求不断增长，提高该技术的抛光效率成为一种必然趋势。本文从研究磁流变抛光液料浆的性质出发，建立了以pH值调节为手段改善抛光液性能的实验方法。采用透射电镜、粒度分析，黏度测试和Zeta电位测试等实验分析表征了抛光颗粒的分散行为及料浆的流变特性，并对抛光料浆特性进行了研究和优化。结果表明：当pH值为12时，抛光料浆具有绝对值最大的Zeta电位(33.28 mV)和最小的颗粒粒径(260 nm)，获得了抛光颗粒分散均匀、悬浮性能稳定的料浆。使用该料浆抛光液与初始抛光液在相同工艺条件下对熔石英进行抛光。实验结果表明，在未明显恶化表面粗糙度的前提下，该抛光液的峰去除效率和体去除效率分别提升87%和66%，获得了良好、高效的去除效果。

Abstract

With increasing applications of Magnetorheological Finishing (MRF) in the field of ultra-precision manufacturing

enhancement of the efficiency of MRF is imperative. To address this requirement

a technique based on pH adjustment was developed in this paper

which in turn

optimized the properties of the polishing slurry. The dispersion behavior of polished particles and the rheological characteristics of the polishing slurry were investigated via scanning electron microscope

particle-size analysis

and Zeta potential test. The results demonstrate that an adjustable pH facilitates the dispersion of nanoparticles. A pH value of 12 has been identified to be the most suitable for the dispersion of the polishing particles. The absolute value of the Zeta potential is observed to be 33.28 mV and the particles diameter of D50 is detected to be 260 nm under this pH. After polishing of fused silica

the alkaline MRF fluid is demonstrated to not only lead to superior material removal rate

with the corresponding peak removal rate and volumetric removal rate increasing by 87% and 66%

respectively

but also achieve a precise level of surface roughness.

关键词

Keywords

references

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