用于飞秒激光制备光纤光栅的相位掩模研制

刘全; 黄爽爽; 鲁金超; 陈新华; 吴建宏

doi:10.3788/OPE.20202804.0844

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用于飞秒激光制备光纤光栅的相位掩模研制

现代应用光学 | 更新时间：2020-08-13

- 用于飞秒激光制备光纤光栅的相位掩模研制
- Phase mask for fabrication of fiber Bragg gratings by femtosecond laser
- 光学精密工程 2020年28卷第4期页码：844-850
- 作者机构：
  
  1.苏州大学光电科学与工程学院 & 苏州纳米科技协同创新中心，江苏苏州 215006
  2.江苏省先进光学制造技术重点实验室 & 教育部现代光学技术重点实验室，江苏苏州 215006
- 作者简介：
  
  [ "刘全 (1978-)，男，安徽滁州人，博士，副研究员，硕士生导师，2001年于安徽师范大学获得理学学士学位，2004年、2013年于苏州大学分别获得硕士、博士学位，主要从事微纳光学、衍射光学、微纳制造技术等方面的研究。E-mail:liuquan@suda.edu.cn" ]
  [ "黄爽爽 (1994-)，男，湖北孝感人，硕士研究生，2016年于长江大学获得学士学位，主要从事微纳光学元件设计及制作等方面的研究。E-mail：20175208009@stu.suda.edu.cn" ]
- 基金信息：
  
  装备预研项目(41423030101);国家自然科学基金资助项目(60907017);上海市全固态激光器与应用技术重点实验室开放课题(2014ADL02);江苏高校优势学科建设工程(PAPD)
- DOI：10.3788/OPE.20202804.0844
  中图分类号： TN253; TN305.7
- 收稿日期：2019-08-25，
  
  修回日期：2019-11-22，
  
  录用日期：2019-11-22，
  
  纸质出版日期：2020-04-15
- 稿件说明：
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刘全, 黄爽爽, 鲁金超, 等. 用于飞秒激光制备光纤光栅的相位掩模研制[J]. 光学精密工程, 2020,28(4):844-850.

Quan LIU, Shuang-shuang HUANG, Jin-chao LU, et al. Phase mask for fabrication of fiber Bragg gratings by femtosecond laser[J]. Optics and precision engineering, 2020, 28(4): 844-850.
刘全, 黄爽爽, 鲁金超, 等. 用于飞秒激光制备光纤光栅的相位掩模研制[J]. 光学精密工程, 2020,28(4):844-850. DOI： 10.3788/OPE.20202804.0844.

Quan LIU, Shuang-shuang HUANG, Jin-chao LU, et al. Phase mask for fabrication of fiber Bragg gratings by femtosecond laser[J]. Optics and precision engineering, 2020, 28(4): 844-850. DOI： 10.3788/OPE.20202804.0844.

摘要

利用严格耦合波理论分析了用于520 nm波长飞秒激光制备光纤光栅的相位掩模的衍射特性，当相位掩模是矩形槽形时，占宽比在0.32~0.43之间，槽形深度在0.57~0.67 μm之间时，能够保证零级衍射效率抑制在2%以内，同时±1级的衍射效率大于35%。在此基础上，利用全息光刻-离子束刻蚀技术，制作了用于520 nm波长飞秒激光的周期为1 067 nm、有效面积大于40 mm×30 mm的相位掩模。实际制作的相位掩模是梯形槽形，槽深是0.665 μm，分析了梯形槽形中梯形角对衍射效率的影响。实验测量表明，该相位掩模的零级衍射效率小于2%，±1级衍射效率大于40%

满足飞秒激光制作光纤光栅的需要。

Abstract

The diffraction characteristics of a phase mask for a 520 nm wavelength Femtosecond laser-written FBG are investigated in this study using rigorous coupled-wave theory (RCWT). The results demonstrate that when the phase mask is a rectangular profile

the groove depth and the duty cycle of phase mask must be within the range of 0.57-0.67 μm and 0.32-0.43

respectively

to achieve the desired 0-order diffraction efficiency of less than 2% and ±1-order diffraction efficiency of more than 35%. Using a fused silica phase mask in a 520 nm wavelength femtosecond laser with a period of 1 067 nm

a ruled area 40 mm×30 mm was fabricated via holographic lithography-ion beam etching. The actually produced phase mask was observed to be a trapezoidal profile with a groove depth of 0.665 μm

whose influence on the diffraction efficiency was analyzed. Experimental measurements demonstrated that the 0-order diffraction efficiency was less than 2% and ±1-order diffraction efficiency was more than 40%

which meet the requirement for fabrication of fiber Bragg grating by femtosecond laser.

关键词

Keywords

references

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