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Rapid and uniform exposure control for wafer motion imaging system
Information Sciences | 更新时间：2024-11-20
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    • Rapid and uniform exposure control for wafer motion imaging system

    • “晶圆飞拍成像系统曝光控制新方法，提升成像质量，缩短参数调整时间。”
    • Optics and Precision Engineering   Vol. 32, Issue 19, Pages: 2933-2944(2024)

    • DOI：10.37188/OPE.20243219.2933    

      CLC： O438

    • Published：10 October 2024，

      Received：19 June 2024，

      Revised：24 July 2024，

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  • WANG Ruoyu,YAN Fuyang,LIU Tundong.Rapid and uniform exposure control for wafer motion imaging system[J].Optics and Precision Engineering,2024,32(19):2933-2944. DOI： 10.37188/OPE.20243219.2933.

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