Mi Baoyong. In Situ Monitoring of Etching End-Point for Plasma and Reactive ion Etching by the Optical Reflection[J]. Editorial Office of Optics and Precision Engineering, 1997,(3): 90-95
Mi Baoyong. In Situ Monitoring of Etching End-Point for Plasma and Reactive ion Etching by the Optical Reflection[J]. Editorial Office of Optics and Precision Engineering, 1997,(3): 90-95DOI:
Diffraction efficiency of Al-coated triangle and holographic sinusoidal grating used in UV region are calculated using the differential formalism of exact electromagnetic theory.The efficiency curves of blazed characteristic of sinusoidal grating is presented.And the influence of apex angle on diffraction efficiency of triangle grating is debated.