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Grating interferometric precision nanometric measurement technology
Precision Measurement and Sensing | 更新时间：2024-09-30
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    • Grating interferometric precision nanometric measurement technology

    • “在精密纳米测量领域，光栅干涉技术凭借其高分辨率和抗干扰能力，成为先进光刻机和超精密机床的关键技术。专家深入分析了光栅干涉测量的精度和误差，为系统开发和优化提供了重要参考。”
    • Optics and Precision Engineering   Vol. 32, Issue 17, Pages: 2591-2611(2024)

    • DOI：10.37188/OPE.20243217.2591    

      CLC： TH744.3;TN247

    • Published：10 September 2024，

      Received：17 April 2024，

      Revised：25 May 2024，

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  • LI Xinghui,CUI Can.Grating interferometric precision nanometric measurement technology[J].Optics and Precision Engineering,2024,32(17):2591-2611. DOI： 10.37188/OPE.20243217.2591.

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Related Author

LI Xinghui
CUI Can
Lian-dong YU
Jia-ming CAO
Hui-ning ZHAO
Hua-kun JIA
Song PU
LU Haolin

Related Institution

Tsinghua-Berkeley Shenzhen Institute， Tsinghua University
School of Instrument Science and Opto-electronics Engineering， Hefei University of Technology
Anhui Province Key Laboratory of Measuring Theory and Precision Instrument
School of Power and Mechanical Engineering， Wuhan University
Advanced Light Source Research Center， Wuhan University
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