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High-speed dynamic focus tracking and error compensation for wafer laser stealth dicing
High-speed dynamic focus tracking and error compensation for wafer laser stealth dicing
- “Researchers have proposed a focus dynamic tracking and error compensation method based on laser triangulation, which adopts a two-level compensation architecture combining offline static calibration and online dynamic correction. The trajectory tracking error is optimized from ± 3.5 μ m to ± 0.50 μ m, providing a solution for high-speed and high-precision invisible cutting of high-end ultra-thin wafers.”
- Optics and Precision Engineering Vol. 34, Issue 19, Pages: 3056-3068(2026)
DOI: 10.3724/OPE.20263419.3056
- CSTR: 32169.14.OPE.20263419.3056
Revised:2026-07-24
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